High-temperature Oxidator furnace
The Oxidator 150 is a high-temperature furnace, especially designed for the oxidation of silicon carbide (SiC) by centrotherm thermal solutions. Its capability to run high process temperatures of up to 1400C and oxidation processes using O2, N2O, NO, NO2 or WetOx atmosphere makes for an excellent combination of flexibility and proven process quality. Equipped with metal-free heating and double vacuum, the Oxidator 150 is currently the safest ToxGas oxidation furnace on the market .
Batch processing of 2, 3, 100 mm und 150 mm wafers or any combination
- Maximum heating rate up to 7.5 K/min
- Batch size up to 50 (150 mm) wafers
- Process pressure range from 850 mbar to atmospheric pressure
Applications
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